Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/123789
Title: DESIGN FABRICATION AND CHARACTERIZATION OF THIN FILM POLYMERIC OPTICAL SPLITTERS
Researcher: RAHUL SINGHAL
Guide(s): M. N. SATYANARAYAN
Keywords: THIN-FILM POLYMERIC OPTICAL
University: Birla Institute of Technology and Science
Completed Date: 
Abstract: Polymers have been accepted as a new-generation material for an optical integrated circuit newlinedue to its various advantages as compared to other optical materials. Some features of newlinepolymers worth highlighting are ease of handling, tailoring the properties by doping, direct newlinedeposition on any substrate and complete compatibility with semiconductor processing newlinetechniques. Polymeric materials became popular in integrated optics because they permitted newlinerapid fabrication of complex and innovative optical elements with very simple technologies newlinelike spin-coating and replication methods. However, those facts depend heavily on the newlinefabrication method and particular polymer. Photonic polymer-based devices are particularly newlineattractive because of their ability to be processed rapidly with high yields, they are cost newlineeffective, and at the same time perform comparatively well. Optical waveguides are newlinestructures that confine and direct optical signals in a region of higher effective index than its newlinesurrounding media. An optical waveguide forms the basis for all integrated photonic devices. newlineThus, it becomes significantly necessary to develop a cost-effective technology for newlinefabrication of low-loss polymeric optical waveguides before initiation of development of newlinepolymeric photonic devices. This thesis presents the fabrication of polymeric optical channel newlineand branching waveguides in photosensitive polymer buried in optical adhesive on a planar newlinesilicon substrate. newlineEpoxy-polymer SU-8 2002, a photosensitive polymer from MicroChem Corporation, USA newlinewas used to form the core of optical planar and channel waveguides. SU-8 2000 series resists newlinehave high functionality and high optical transparency and are sensitive to near-UV radiation. newlinePre- and post-exposure bake times are comparatively smaller for SU-8 2000 than the newlinetraditional SU-8. Lithographically defined SU-8 can provide simpler fabrication processes. newlineImages having exceptionally high aspect ratios and straight sidewalls are readily formed in newlinethick and thin films by contact proximity or projection.
Pagination: 7.25 MB
URI: http://hdl.handle.net/10603/123789
Appears in Departments:Electrical & Electronics Engineering

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